Prof. Cady runs a Biosafety Level 2 (BSL-2) laboratory (at SUNY Polytechnic Institute) with ~5,000 sq. ft. of space. This laboratory includes 30 C & 37 C incubators (both CO2 and non-CO2 equipped), -80 and -20 freezers, +4 C refrigerators, chemical solvents and acid fume hoods, a Class II/A2 biological safety cabinet, Nikon 80i epifluorescence microscope with a cooled QICam CCD camera, Leica SP5 confocal laser scanning microscope (CLSM), Nikon dissecting/stereomicroscope, two (2) Fisherbrand inverted phase contrast microscopes, Bruker Bioscope Catalyst atomic force microscope (AFM), Tecan M200 microplate fluorometer/luminometer with UV/VIS spectrophotometer capability, BioRad real-time PCR thermocycler, BioRad Protean II gel electrophoresis equipment, centrifuges, autoclave, Nanodrop ND1000 UV-Vis spectrophotometer and ND3300 fluorometer, Malvern Nano-ZS dynamic light scattering (DLS)/zeta potential instrument, multiple KD scientific and Harvard Apparatus syringe pumps, and all other general laboratory equipment needed for cell growth and maintenance, protein chemistry and biochemical analysis. The labs are equipped with a humidity-controlled Nano eNabler (NeN) QPL instrument (Bioforce Nanosciences) and ArrayIT Spot Bot II pin based printer for cell and molecular printing installed next to cell incubators and fluorescent microscopes. The lab also houses a Perkin Elmer Nexion 350X ICP-MS instrument for trace metal and nanomaterial analysis/quantification. In addition to the described biological laboratories, the PI’s can utilize existing facilities at SUNY Poly including all available metrology, surface analytical tools and electron/visual microscopy.
Nano/Micro Fabrication Facilities & Capabilities:
Profs. Cady full access to the SUNY Poly nanofabrication complex for all nano/microfabrication tasks. SUNY Poly's fabrication facilities located at its Albany NanoTech Complex house more than 120 wafer processing and inline metrology tools. The tool sets installed in SUNY Poly's world-class facilities are dedicated to supporting the industry's wafer processing needs for the next several device generations ranging from 65nm to 7nm, and allowing exploratory work in support of full scaled nanotechnology. A complete list of available fabrication and metrology equipment and processes can be found at: https://sunypoly.edu/research/wafer-fabrication/wafer-processing-rd.html
SUNY Poly's next-generation facilities are currently operational with a fully enabled 65nm low power CMOS and RF CMOS offering. Early user hardware, custom R&D and on-demand derivative development support is provided at SUNY Poly with access to unique state-of-the-art industry standard semiconductor fabrication facilities, which serves as a technology test-bed leading to the development, demonstration, integration and qualification of advanced fabrication technologies for the semiconductor industry.
The SUNY Poly facilities house 300mm advanced lithography platforms to support 193nm immersion lithography development and EUV lithography development. Also installed are advanced wafer platforms for planarization, copper plating, etch development, ion implantation, thin film development and wet cleaning technology. In total, the nanofabrication complex houses the latest nanofabrication technology available, and house all the technology and equipment needed for the proposed project including resist spinners, UV immersion steppers, nanoimprint lithography, EUV lithography, E-beam lithography, PVD, CVD, PECVD and ALD deposition tools, chemical mechanical planarization (CMP) reactive ion etching, acid/base and solvent fume hoods.
Poly nano/micro fabrication facilities are broken down into the following sections, with these general capabilities: NanoFab 300 North is a 228,000 square foot, $175 million facility including 35,000 square feet of cleanroom space with Class 1 capable 300mm wafer production. NanoFab 300 South is a 150,000 square foot, $50 million facility including 32,000 square feet of cleanroom space. The facility also includes classrooms and offices for Poly. NanoFab 200 (also known as CESTM) is a 70,000 square foot facility that includes additional 4,000 square feet of cleanroom space, plus CNSE metrology labs. Equipment in this facility includes resist spinners, contact aligners, RIE etchers, evaporative and atomic layer deposition (ALD) thin film deposition tools, a plasma-based ashers, thermal annealing chambers and furnaces. Metrology equipment includes focused ion beam (FIB) sample preparation, X-ray diffraction, TEM, SEM, XPS, SIMS, and Auger spectroscopy. NanoFab Central, a 100,000-square-foot building that houses 15,000 square feet of 300mm wafer, class 1 capable cleanroom space, and NanoFab East, a separate 250,000-square-foot office, laboratory and classroom building. The newest building on-site to include fabrication facilities is NanoFabX, which was completed in 2013, and is a 500,000-square-foot facility with 50,000 square feet of 300mm wafer cleanrooms.
One of the unique metrology capabilities at SUNY Poly is a separately housed FEI Titan Themis S/TEM. This system is one of the most advanced electron microscopy platforms to date, capble of imaging and spectroscopy at the atomic level. The system is equipped wth multiple cameras and detectors. The system is capable of providing simoultanous information about position, bonding and composition of atoms and can be fitted with a tomography holder to obtain nm-resolution 3D reconstruction and electric field maps.
Other facilities at SUNY Poly include a D-180 and D-75 MOCVD epitaxial growth system capable of growing the entire III-Nitride quaternary. This facility will be used for AlN quantum material.
Electrical Testing & Evaluation:
Prof. Cady maintains an electronics testing laboratory with ~500 sq. ft. of space which can be used for evaluation and analysis of electronic devices. The electronics testing laboratory contains a faraday cage enclosed Cascade M150 8” manual probe station, and a Wenesco 8” HP99D thermal stage. Electrical source and measure is carried out by an Agilent B1500A semiconductor parameter analyzer with DC and pulsing measurement capability, and associated Lenovo E30 workstation running Agilent EasyExpert software for data collection and analysis.
Additional electrical test equipment is available in a 900 sq. ft. lab space containing four major probers. These include two Cascade Microchamber test stations equipped with an Agilent B1500A semiconductor device analyzer, Keithley 708B switching matrix, Agilent E4908A precision LCR meter, Agilent 81110A pulse/pattern generator, Keithley 4200-SC5 semiconductor characterization system, Keysight N7744A optical power meter, Keithley 2613 system source meter and Keysight 8163B lightwave multiplier. There are two Suss Microtech semi-automated probe stations. These are equipped with Agilent B1500A semiconductor device analyzer, Agilent N5227A PNA network analyzer (10MHz-67GHz), WavePro 740Zi 4GHz oscilloscope, Anritsu 37369D vector network analyzer, HP 4145B semiconductor parameter analyzer, Agilent 3560A dynamic signal analyzer and ProPlus 9812B noise analyzer controller. There is also a Suss Microtech cryogenic test station capable of operating at LN2 temperatures in vacuum to 1E-5torr.
Multiple Lenovo desktop computers with internet access are available, all equipped with appropriate software for data analysis, word processing, email, etc. The PI and his students also have access to OriginLab, Statistica and GraphPad Prism (plotting and statistical analysis software); COMSOL (finite element analysis and simulation software); as well as L-Edit, Cadence, Mentor Graphics, and K-Layout (lithographic layout software) that is hosted on the SUNY Poly network and is supported by the SUNY Poly information technologies (CNSE Help) department.