CDRInfo: IBM Researchers Talk About the Future of EUV, Research at SUNY Poly at SPIE
Published:
Friday, February 23, 2018 - 14:33
CDRInfo
For both the 7nm and 5nm nodes, IBM and its alliance partners at the SUNY Poly Colleges of Nanoscale Science and Engineering in Albany, NY relied heavily on transistor and interconnect patterning driven by Extreme Ultraviolet (EUV) lithography...
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