The paper, "X-ray metrology of nanowire/ nanosheet FETs for advanced technology nodes," by SUNY Poly Empire Innovation Professor of Nanoscale Science Dr. Alain Diebold, with researchers from the National Institute of Standards and Technology (NIST), Onto Innovations, and TEL Technology Ctr., America, LLC, received the "Diana Nyyssonen Memorial Best Paper Award 2020/2021" at SPIE Advanced Lithography's 2021 virtual conference.

According to SPIE, "to win this Award requires a very significant new contribution to the field. The selection of the best paper is initiated during the Conference by nomination, followed by extensive review by the Program Committee. It is based on both the technical merit and persuasiveness of the oral presentation and the overall quality of the published paper. Past award winners include leading international researchers in the area of semiconductor metrology and process control whose contributions have fundamentally improved the way semiconductors are manufactured."


The paper was originally published in Proceedings Volume 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV.