SUNY Poly CNSE Colloquium Series Presents Sonia Castellanos
Sonia Castellanos from the Advanced Research Center for Nanolithography (ARCNL) will discuss “Metal-Oxide Photoresists for Extreme Ultraviolet Lithography” at the February 23 colloquium series. Light refreshments will be served beginning at 11 a.m. in the South Rotunda.