Research by SUNY Poly's Dr. Robert Brainard, with Graduate Research Assistant Michael Murphy, and in collaboration with the University at Albany, has been published in the Journal of Polymer Science.

The article, "Photosensitive Hypervalent Fluorinated Sulfur Containing Polymers for Light Sensitive Applications," details "a novel photosensitive polymer responsive to ultraviolet (UV) 200–450 nm, extreme ultraviolet (EUV) 13.5 nm, or 50 keV electron beam (EB) radiation with potential wide-ranging applications.

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