SUNY Poly Next-Gen Transistor Research Featured in Advanced Materials
Published:
Tuesday, June 11, 2019 - 09:19
Dr. Ji Ung Lee and his research team, whose work, "Schottky–Mott Limit: Gate‐Tunable Graphene–WSe2 Heterojunctions at the Schottky–Mott Limit," could lead to better transistors, is featured in Advanced Materials with cover art by student Sam Lagasse.
