Professional Background

• Lithography Process Engineer, College of Nanoscale Science and Engineering
• Lithography process engineer , Qimonda North America
• Lithography process development, (immersion & extreme ultra violet) Infineon Technologies
• Applications engineer, Litel Instruments

Education

• B.S. (Microelectronic Engineering), Rochester Institute of Technology, Rochester, NY 2002

Responsibilities

As senior lithography process engineer for CNSE Mr. Martinick is responsible for the execution of advanced lithography related joint development programs including support of CNSE's advanced BEOL and FEOL lithography sector. He also represents technical lithography aspects to current and future partners of CNSE.

Patents

• 7,291,569 - Fluids for immersion lithography systems

Publications

• Evaluation of double exposure processes for advanced logic nodes
  Proc. SPIE 7273-179 (2009)
• Initial experience establishing an EUV baseline lithography process for manufacturability assessment
  Proc. SPIE 6517, 65170U (2007)
• A year in the life of an immersion lithography alpha tool at Albany NanoTech
  Proc. SPIE 6151, 615101 (2006)
• Imaging with Immersion Technology at Albany Nanotech (Presenter)
  2nd International Symposium on Immersion Lithography (2005)
• Scanner and stepper intrafield distortion characterization: a comparison and correlation of current techniques
  Proc. SPIE 4344, 623 (2001)