Wenli Z. Collison
Contact
Professional Background
- RIE Process Engineer/Equipment Engineer: CSR/Photonics/META, Albany, NY. 2019-present
- RIE/PVD/PECVD/ECD Process and Equipment Owner: PEMC, Albany, NY. 2017-2018
- RIE Process Engineer: G450C, Albany, NY. 2012-2016
- Staff Process Engineer : Lam Research, Albany, NY. 2010-2012
- Consultant: Intevac Inc., Santa Clara, CA. 2006-2010
- Staff /Senior /Process Engineer III: Lam Research. Fremont, CA. 1995-2004
- Postdoctoral Researcher : Univ. of Illinois, Urbana-Champaign, IL. 1994-1995
Education
- 1994 Ph.D. (Plasma Physics), Univ. of California, San Diego
- 1991 M.S. (Physics), Univ. of California, San Diego
- 1989 B.S. (Solid State Physics), Univ. of Science and Technology of China
Responsibilities
As an etch engineer in the CSR etch team, Wenli is currently responsible for etch process development for various projects including photonics and META project. She is also equipment engineer in charge of multiple etch tool installations in Applied Materials’ META project.
Issued Patents: 12 issued patents
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same Patent No. 8,114,246 Issue date: Feb. 2012
Inductively coupled plasma downstream strip module Patent No. 6,692,649 Issue date: Feb. 2004
Plasma processor with coil having variable rf coupling Patent No. 6,229,264 Issue date: May 2001
Processing chamber with optical window cleaned using process gas Patent No. 6,052,176 Issue date: April 2000
Publications and Conferences
450mm Etch Process Development and Process Chamber Evaluation Using 193i DSA Guided Pattern , SPIE Jan. 2016 Wenli Collison, Yii-Cheng Lin, Shannon Dunn, Hiroaki Takikawa, James Paris, Lucy Chen, Troy Detrick, Jun Belen, George Stojakovic, Michael Goss, Norman Fish, Minjoon Park, Chih-Ming Sun, Mark Kelling, Pinyen Lin
Studies of the Low-pressure Inductively-coupled Plasma Etching for a Larger Area Wafer Using Plasma Modeling and Langmuir Probe JVST A Jan. 1998 Wenli Collison, Tom Ni and Michael Barnes
A 3-D Model for Inductively-coupled Plasma Etch Reactors Invited Talk AVS New Mexico Chapter Annual Meeting 1997 Mark Kushner, Wenli Collison, Michael Grapperhaus, John Holland and Michael Barnes