Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena: Process development for high resolution hydrogen silsesquioxane patterning using a commercial scanner for extreme...
Published:
Tuesday, February 21, 2017 - 10:04
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics
Abstract
The semiconductor industry is transitioning toward the use of extreme ultraviolet (EUV) lithography as a next generation patterning technology.
