Integrated Planar CMOS

 90 nm 65 nm 32 nm

  • Shallow Trench Isolation
    • Min CD = 100nm
      • Retrograde Wells
      • Hi-k / MG
    • ALD & MOCVD Hi-k
    • ALD, CVD & PVD MG
  • Halo / Extension Implants
  • Oxide / Nitride Spacer
  • Nickel Silicide
  • Copper Contact
  • Testable Structures at M1

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