Material Characterization

In addition to extensive characterization facility located at SUNY Poly, the following are in close proximity of material growth laboratory:  

Photoluminescence

  • Pulsed and CW laser excitation sources at 225 nm (HeAg) and 325 nm (HeCd) available for high-resolution spectral measurement (1200 rules/mm dispersed in ¼ m monochromator)
  • Intensity and and temperature controls enable measurements over 5 orders of magnitude of excitation power and variable temperatures 10–300 K respectively

Hall Effect Measurement

  • Van der Pauw method (LN2 capable)
  • Allows determination of carrier concentration, mobility, and resistivity

Hg-Probe Capacitance-Voltage Measurement

  • Liquid Hg used to form contactless electrical measurement for non-destructive doping profile measurement
  • Coupled to Agilent E4980A and Keithley 4200 for automated measurements up to 5 MHz
  • Can accommodate variable wafer sizes >1cm2
Material characterization chart CSM Hg-Probe
  CSM Hg-Probe

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